Journey to an Ownership Culture: Insights from the ESOP Community
Author: Dawn K Brohawn
The first Employee Stock Ownership Plan (ESOP) was launched in 1956, but few people knew about it, and even fewer understood it. Today, over 10,000 companies offer some form of ESOP. These are companies who have decided that the best way to operate is to create an environment where everyone shares in the responsibilities and the rewards of ownership. "Journey to an Ownership Culture" tells many stories, in the words of the business leaders who have developed and maintained both successful and not-so-successful ESOPs. These first-person accounts are filled with practical advice, usable guidelines, legislation and regulations involved in creating an ESOP, the pitfalls to avoid, and how-to examples. A useful handbook for all present or future business owners, their employees, business libraries, and corporations. An essential purchase for libraries supporting a business collection.
Author Biography: The ESOP Association is the leading national association committed to employee ownership through employee stock ownership plans.
Booknews
Seventeen contributions relate the experiences of business leaders who have developed and maintained both successful and not-so-successful Employee Stock Ownership Plans (ESOP). For those who are new to the ESOP concept, or who want to begin an ESOP, or who are looking for ways to improve an ESOP already in place, these first-person accounts are filled with practical advice, usable guidelines, pitfalls to avoid, and how-to examples. Annotation c. by Book News, Inc., Portland, Or.
Read also Valuation or Economics of the Welfare State
Microlithography: Science and Technology
Author: James R Sheats
This self-contained text details both elementary and advanced aspects of submicron microlithography - providing a balanced treatment of theoretical and operating practices as well as complete information on current research in the field. Including discussions on electron beam, x-ray, and proximal probe techniques and enhanced with timesaving citations to key sources in the literature and more than 600 tables, equations, drawings, and photographs that clarify the material, the book covers mechanical systems, optics, excimer laser light sources, alignment techniques and analysis, resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, metrology, and more.
International Journal of Electrical Engineering Education
...The editors...have done an excellent gob of gathering the knowledge of a number of world experts and blending it into a harmonious whole which will serve as a reference for some time to come, even in this fast-moving field.
Booknews
Details both elementary and advanced aspects of sub-micron microlithography, discussing theoretical and operating practices and providing complete information on current research. Coverage includes mechanical systems; optics; excimer laser light sources; alignment techniques and analysis; resist chemistry; processing; multilayer lithography; plasma and reactive ion etching; metrology; electron beam, x-ray, and proximal probe techniques. For physicists as well as electrical, optical, semiconductor, integrated circuit process, and process equipment engineers. Annotation c. by Book News, Inc., Portland, Or.
Table of Contents:
| Preface | ||
| Ch. 1 | System Overview of Optical Steppers and Scanners | 1 |
| Ch. 2 | Optical Lithography Modeling | 109 |
| Ch. 3 | Optics for Photolithography | 171 |
| Ch. 4 | Krypton Fluoride Excimer Laser for Advanced Microlithography | 271 |
| Ch. 5 | Alignment and Overlay | 317 |
| Ch. 6 | Electron Beam Lithography Systems | 367 |
| Ch. 7 | X-Ray Lithography | 403 |
| Ch. 8 | Chemistry of Photoresist Materials | 429 |
| Ch. 9 | Resist Processing | 515 |
| Ch. 10 | Multilayer Resist Technology | 567 |
| Ch. 11 | Dry Etching of Photoresists | 615 |
| Ch. 12 | Critical Dimensional Metrology | 645 |
| Ch. 13 | E-Beam and Proximal Probe Processes for Nanolithography | 715 |
| Index | 777 |
